Nanomaterials

Sm₂TM₁₇ sintered magnets, (where TM = Co, Fe, Cu, Zr), are typically utilised in high temperature magnetic applications due to their magnetic properties being very stable at 200–350 °C. Sm and Co are critical materials and need to be recycled to reduce reliance on virgin material supply chains. This work explored HD processing of Sm₂TM₁₇ sintered magnet production scrap as a potential recycling technique. Sintered magnet scrap was initially analysed compositionally, microstructurally and magnetically to determine issues with magnet quality. Scrap material was then HD processed at 18 bar and 2 bar at temperatures between 25–300 °C. The resultant material was characterised in terms of hydrogen content, particle size, degassing behaviour and unit cell expansion. Production scrap magnets exhibited irregular demagnetisation traces with poor domain wall pinning behaviour. Non-magnetic ZrC inclusions likely prevented cell structure formation locally and hence were poor domain wall pinning sites. Scrap material processed at 18 bar and 2 bar required temperatures of 100 °C to allow for the greatest extent of HD reaction, reaching 0.299 Wt.% and 0.323 Wt.% hydrogen respectively. The HD behaviour of production scrap material was comparable to commercial grade magnets. Therefore, HD is a potentially viable technique for recycling Sm₂TM₁₇ sintered magnet production scrap.

Ultrafast laser processing is constrained by an inherent throughput–resolution trade-off, typically addressed either by high-speed single-beam scanning or by parallel processing approaches. Here, a scanning-based dynamic mask projection concept is presented, combining both strategies by integrating a digital micromirror device (DMD) for dynamic binary amplitude mask generation with galvanometric scanning for high-speed lateral repositioning of the projected pattern. A high-numerical-aperture microscope objective is used to project the mask for thin film laser ablation with sub-micrometer feature sizes, while scanning extends the processing area beyond a single projected pattern, ultimately limited by the objective’s field of view. The concept is demonstrated by selective single-pulse pattern ablation of 10 nm thick tantalum nitride (TaN) thin films on glass substrates using 230 fs pulses at a center wavelength of 515 nm. The optical system enables a 770 nm minimum feature size across a scan field with an area-equivalent circular diameter of 550 µm. Dynamic mask projection combined with fast scanning offers a scalable route to high-throughput laser nanoprocessing and is relevant to fabrication and processing of nanomaterials, digital mask lithography, and micro- and nanomachining.

Oxygen-focused ion beam induced deposition (O-FIBID) enables the direct-write fabrication of Pt nanostructures while simultaneously enhancing purity concurrently through reactive oxygen–deposit interactions. By systematically varying the dwell time, accelerating voltage, and precursor pressure, the Pt content and conductivity can be controlled. Under optimum conditions, the Pt content reached 63 at.%. Across the dwell-time range used for resistivity measurements, the Pt content increased from 20 to 33 at.%, while the resistivity decreased from 2.9 × 10⁴ μΩ·cm to 1.2 × 10³ μΩ·cm, which is consistent with enhanced percolation through Pt grains and the lower intrinsic resistivity of the purer Pt deposit. The simulation results support a purification mechanism driven by the beam-induced activation of implanted oxygen balanced against the preferential sputtering of Pt. These results demonstrate O-FIBID as a viable method for the nanoscale direct write of conductive Pt without post-processing, and some deviations from conventional FIBID wisdom are observed. These results serve as a foundation for exploring nascent, reactive focused ion beam-induced deposition processes.